optical projection lithography

projekcinė fotolitografija statusas T sritis radioelektronika atitikmenys: angl. optical projection lithography; projection photolithography vok. Lichtprojektionslithografie, f; Projektionsphotolithographie, f rus. проекционная фотолитография, f pranc. photolithographie de projection, f

Radioelektronikos terminų žodynas. – Vilnius : BĮ UAB „Litimo“. . 2000.

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  • projection photolithography — projekcinė fotolitografija statusas T sritis radioelektronika atitikmenys: angl. optical projection lithography; projection photolithography vok. Lichtprojektionslithografie, f; Projektionsphotolithographie, f rus. проекционная фотолитография, f… …   Radioelektronikos terminų žodynas

  • Computational lithography — (also known as computational scaling) is the set of mathematical and algorithmic approaches designed to improve the resolution attainable through photolithography. Computational lithography has come to the forefront of photolithography in 2008 as …   Wikipedia

  • photolithographie de projection — projekcinė fotolitografija statusas T sritis radioelektronika atitikmenys: angl. optical projection lithography; projection photolithography vok. Lichtprojektionslithografie, f; Projektionsphotolithographie, f rus. проекционная фотолитография, f… …   Radioelektronikos terminų žodynas

  • Electron beam lithography — (often abbreviated as e beam lithography) is the practice of scanning a beam of electrons in a patterned fashion across a surface covered with a film (called the resist),cite book |last= McCord |first=M. A. |coauthors=M. J. Rooks |title=… …   Wikipedia

  • Next-generation lithography — (NGL) is a term used in integrated circuit manufacturing to describe the lithography technologies slated to replace photolithography. As of 2009 the most advanced form of photolithography is immersion lithography, in which water is used as an… …   Wikipedia

  • Contact lithography — Contact lithography, also known as contact printing, is a form of photolithography whereby the image to be printed is obtained by illumination of a photomask in direct contact with a substrate coated with an imaging photoresist layer. Contents 1… …   Wikipedia

  • Extreme ultraviolet lithography — (also known as EUV or EUVL ) is a next generation lithography technology using the 13.5 nm EUV wavelength. EUVL opticsEUVL is a significant departure from the deep ultraviolet lithography used today. All matter absorbs EUV radiation. Hence, EUV… …   Wikipedia

  • Lichtprojektionslithografie — projekcinė fotolitografija statusas T sritis radioelektronika atitikmenys: angl. optical projection lithography; projection photolithography vok. Lichtprojektionslithografie, f; Projektionsphotolithographie, f rus. проекционная фотолитография, f… …   Radioelektronikos terminų žodynas

  • Projektionsphotolithographie — projekcinė fotolitografija statusas T sritis radioelektronika atitikmenys: angl. optical projection lithography; projection photolithography vok. Lichtprojektionslithografie, f; Projektionsphotolithographie, f rus. проекционная фотолитография, f… …   Radioelektronikos terminų žodynas

  • projekcinė fotolitografija — statusas T sritis radioelektronika atitikmenys: angl. optical projection lithography; projection photolithography vok. Lichtprojektionslithografie, f; Projektionsphotolithographie, f rus. проекционная фотолитография, f pranc. photolithographie de …   Radioelektronikos terminų žodynas

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